Plasma Chemistry And Plasma Processing impact factor, indexing, ranking (2024)

Aim and Scope

The Plasma Chemistry And Plasma Processing is a research journal that publishes research related to Chemical Engineering; Chemistry; Materials Science; Physics and Astronomy. This journal is published by the Springer New York. The ISSN of this journal is 02724324, 15728986. Based on the Scopus data, the SCImago Journal Rank (SJR) of plasma chemistry and plasma processing is 0.577.

Also, please check the following important details about plasma chemistry and plasma processing: Publisher, ISSN, Ranking, Indexing, Impact Factor (if applicable), Publication fee (APC), Review Time, and Acceptance Rate.

According to Clarivate's JCR, journals indexed in SCIE/SSCI have an impact factor.

Plasma Chemistry And Plasma Processing Ranking

Impact Factor: 3.337

Total Citations: 4005

SJR (SCImago Journal Rank): 0.577

Quartile: Q2

The Impact Factor of Plasma Chemistry And Plasma Processing is 3.337.

The impact factor (IF) is a measure of the frequency with which the average article in a journal has been cited in a particular year. It is used to measure the importance or rank of a journal by calculating the times its articles are cited.

The impact factor was devised by Eugene Garfield, the founder of the Institute for Scientific Information (ISI) in Philadelphia. Impact factors began to be calculated yearly starting from 1975 for journals listed in the Journal Citation Reports (JCR). ISI was acquired by Thomson Scientific & Healthcare in 1992, and became known as Thomson ISI. In 2018, Thomson-Reuters spun off and sold ISI to Onex Corporation and Baring Private Equity Asia. They founded a new corporation, Clarivate, which is now the publisher of the JCR.

Important Metrics

Journal Title:	Plasma Chemistry and Plasma Processing
Publisher:	Springer New York
ISSN:	02724324, 15728986
Type:	journal
Journal Scope:	Chemical Engineering; Chemistry; Materials Science; Physics and Astronomy
Country:	United States
H-Index:	72
SJR:	0.577
Quartile:	Chemical Engineering (miscellaneous) (Q2); Chemistry (miscellaneous) (Q2); Condensed Matter Physics (Q2); Surfaces, Coatings and Films (Q2)

plasma chemistry and plasma processing Indexing

The plasma chemistry and plasma processing is indexed in:

UGC CARE
Scopus
Web of Science (SCIE)

An indexed journal means that the journal has gone through and passed a review process of certain requirements done by a journal indexer.

The Web of Science Core Collection includes the Science Citation Index Expanded (SCIE), Social Sciences Citation Index (SSCI), Arts & Humanities Citation Index (AHCI), and Emerging Sources Citation Index (ESCI).

Plasma Chemistry And Plasma Processing Impact Factor 2024

The latest impact factor of plasma chemistry and plasma processing is 3.337.

The impact factor (IF) is a measure of the frequency with which the average article in a journal has been cited in a particular year. It is used to measure the importance or rank of a journal by calculating the times it's articles are cited.

Note: Every year, The Clarivate releases the Journal Citation Report (JCR). The JCR provides information about academic journals including impact factor. The latest JCR was released in June, 2023. The JCR 2024 will be released in the June 2024.

Plasma Chemistry And Plasma Processing Quartile

The latest Quartile of plasma chemistry and plasma processing is Q2.

Each subject category of journals is divided into four quartiles: Q1, Q2, Q3, Q4. Q1 is occupied by the top 25% of journals in the list; Q2 is occupied by journals in the 25 to 50% group; Q3 is occupied by journals in the 50 to 75% group and Q4 is occupied by journals in the 75 to 100% group.

Call for Papers

Visit to the official website of the journal/ conference to check the details about call for papers.

How to publish in Plasma Chemistry And Plasma Processing?

If your research is related to Chemical Engineering; Chemistry; Materials Science; Physics and Astronomy, then visit the official website of plasma chemistry and plasma processing and send your manuscript.

Tips for publishing in Plasma Chemistry And Plasma Processing:

Selection of research problem.
Presenting a solution.
Designing the paper.
Make your manuscript publication worthy.
Write an effective results section.
Mind your references.

Acceptance Rate

Acceptance rate is the ratio of the number of articles submitted to the number of articles published. Researchers can check the acceptance rate on the journal website. Alternatively, they can contact the editor of the journal.

Journal Publication Time

The publication time may vary depending on factors such as the complexity of the research and the current workload of the editorial team. Journals typically request reviewers to submit their reviews within 3-4 weeks. However, some journals lack mechanisms to enforce this deadline, making it difficult to predict the duration of the peer review process.

The review time also depends upon the quality of the research paper.